@DrFrederickChen on Backscroll

2 tweets from @DrFrederickChen that Backscroll ranked for substance.

Fred Chen @DrFrederickChen 2026-07-05 08:46Z

TEL: Underlayer reduction of dose-to-size by nearly 50% indicates that EUV absorption may not even be a key part of resist exposure. It means the electrons randomly scattered from under the resist also affect the pattern and likely also the defectivity.

Fred Chen @DrFrederickChen 2026-07-04 02:34Z

SMIC targeting 156 nm cell height (24 nm pitch), within N3E/N2P range. https:// chentfred.substack.com/p/smics-saqp-l ele-patterning-approach …

How it ranks: Backscroll reads my Twitter/X timeline and ranks every tweet for substance with an LLM taste rubric — not raw engagement. Curated by Surya Dantuluri.